Résultats du processus de synthèse de l'article arXiv : 1701.07758v1

Résumé : Contact resistance is a severe performance bottleneck for electronic devices based on two-dimensional layered (2D) semiconductors, whose contacts are Schottky rather than Ohmic. Although there is general consensus that the injection mechanism changes from thermionic to tunneling with gate biasing, existing models tend to oversimplify the transport problem, by neglecting the 2D transport nature and the modulation of the Schottky barrier height, the latter being of particular importance in back-gated devices. In this work, we develop a semi-analytical model based on Bardeen's transfer Hamiltonian approach to describe both effects. Remarkably, our model is able to reproduce several experimental observations of a metallic behavior in the contact resistance, i.e., a decreasing resistance with decreasing temperature, occurring at high gate voltage.