Semi-analytical model of the contact resistance in two-dimensional semiconductors
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- Contact resistance in electronic devices based on 2D semiconductors is a significant performance bottleneck
- These semiconductors have Schottky contacts instead of Ohmic contacts
- Existing models oversimplify the transport problem by neglecting the 2D transport nature and modulation of the Schottky barrier height
- A semi-analytical model based on Bardeen's transfer Hamiltonian approach was developed to address this issue
- The model successfully reproduces experimental observations of metallic behavior in contact resistance
- Contact resistance exhibits a decreasing trend with decreasing temperature at high gate voltage
- Unique electronic properties in 2D semiconductors can be harnessed for improved device performance
- The study provides valuable insights into understanding and optimizing contact resistance in electronic devices based on 2D semiconductors
- The developed semi-analytical model offers a more accurate description of the transport problem and can guide future research efforts.
Authors: Roberto Grassi, Yanqing Wu, Steven J. Koester, Tony Low
Abstract: Contact resistance is a severe performance bottleneck for electronic devices based on two-dimensional layered (2D) semiconductors, whose contacts are Schottky rather than Ohmic. Although there is general consensus that the injection mechanism changes from thermionic to tunneling with gate biasing, existing models tend to oversimplify the transport problem, by neglecting the 2D transport nature and the modulation of the Schottky barrier height, the latter being of particular importance in back-gated devices. In this work, we develop a semi-analytical model based on Bardeen's transfer Hamiltonian approach to describe both effects. Remarkably, our model is able to reproduce several experimental observations of a metallic behavior in the contact resistance, i.e., a decreasing resistance with decreasing temperature, occurring at high gate voltage.
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